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Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
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    Buy cheap Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ from wholesalers
     
    Buy cheap Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ from wholesalers
    • Buy cheap Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ from wholesalers

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

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    Brand Name : Jietai
    Model Number : JTM-100504AD
    Certification : CE, FCC, ROHS, etc.
    Price : ¥800000
    Payment Terms : T/T
    Supply Ability : One unit. It will take 30 to 60 days.
    Delivery Time : 30-60work days
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    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃


    Product Introduction: Semiconductor Silicon Wafer Cleaner

    Engineered specifically for semiconductor manufacturing, this precision cleaning system integrates multi-stage ultrasonic processes to meet the stringent surface purity requirements of silicon wafers, ensuring minimal particle contamination and residual removal critical for wafer fabrication.

    Core Cleaning Processes:

    • Ultrasonic Alkaline Cleaning: Utilizes alkaline chemistry combined with ultrasonic energy to effectively remove organic contaminants, photoresist residues, and large particulate matter from wafer surfaces, preparing substrates for subsequent processing.
    • Ultrasonic Acid Cleaning: Targets inorganic impurities (e.g., metal ions, oxides) through acid-based ultrasonic treatment, leveraging cavitation effects to dislodge submicron contaminants embedded in wafer textures or patterned structures.
    • DI Water Rinsing: Final stage employs high-purity deionized water for thorough rinsing, eliminating residual cleaning agents and ensuring surface neutrality, a prerequisite for post-cleaning wafer handling and processing.

    Technical Specifications:

    • Ultrasonic Frequency: 40KHz-80KHz (multi-frequency adjustable, optimizing cavitation intensity for different contamination types)
    • Operating Temperature: 60℃ (precision-controlled thermal environment to enhance chemical reactivity and cleaning efficiency)
    • Material Compatibility: Constructed with PVDF, quartz, and 316L stainless steel components to resist corrosive chemistries and prevent secondary contamination.

    Key Advantages:

    • Achieves sub-10nm particle removal efficiency, compliant with SEMI standards for advanced wafer processing
    • Multi-frequency ultrasonic configuration adapts to diverse cleaning requirements (from bare wafer to patterned wafer stages)
    • Closed-loop temperature control ensures process repeatability, critical for batch-to-batch consistency
    • Integrates seamlessly into semiconductor front-end and back-end manufacturing lines

    Application: Ideal for cleaning silicon wafers in IC manufacturing, MEMS fabrication, and semiconductor packaging processes, where surface integrity directly impacts device performance and yield.

    Keywords: Semiconductor wafer cleaner, ultrasonic alkaline/acid cleaning, DI water rinsing, 40-80KHz, 60℃ temperature control, silicon wafer processing

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

    Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃

    Quality Semiconductor Silicon Wafer Cleaner - Ultrasonic Alkaline/Acid Cleaning + DI Water Rinsing, 40KHz-80KHz, 60℃ for sale
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